Lithography apparatus

Details Lithography apparatus Lithography apparatus

2006-06-13

2006-06-13

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07061583

ABSTRACT:
An illumination system for a microlithographic exposure apparatus comprises an adjustable axicon, a variable zoom element, and a multipole illumination mode generating element. By controlling the optical components, the illumination mode can be varied continuously between conventional, annular, and multipole.

REFERENCES:
patent: 3492635 (1970-01-01), Farr
patent: 3639039 (1972-02-01), Rhodes, Jr.
patent: 3658420 (1972-04-01), Axelrod
patent: 3729252 (1973-04-01), Nelson
patent: 3770340 (1973-11-01), Cronin et al.
patent: 3776633 (1973-12-01), Frosch et al.
patent: 4241390 (1980-12-01), Markle et al.
patent: 4291938 (1981-09-01), Wagner
patent: 4370026 (1983-01-01), Dubroeucq et al.
patent: 4472023 (1984-09-01), Yamamoto
patent: 4497015 (1985-01-01), Konno et al.
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 4780747 (1988-10-01), Suzuki et al.
patent: 4789222 (1988-12-01), Ota et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4841341 (1989-06-01), Ogawa et al.
patent: 4851882 (1989-07-01), Takahashi et al.
patent: 4854669 (1989-08-01), Birnbach et al.
patent: 4931830 (1990-06-01), Suwa et al.
patent: 4936665 (1990-06-01), Whitney
patent: 4939630 (1990-07-01), Kikuchi
patent: 4947413 (1990-08-01), Jewell et al.
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4988188 (1991-01-01), Ohta
patent: 5004348 (1991-04-01), Magome
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5305054 (1994-04-01), Suzuki et al.
patent: 5337097 (1994-08-01), Suzuki et al.
patent: 5517279 (1996-05-01), Hugle et al.
patent: 5572287 (1996-11-01), Wangler et al.
patent: 5598250 (1997-01-01), Bae
patent: 5638211 (1997-06-01), Shiraishi
patent: 5659409 (1997-08-01), Ooi et al.
patent: 5673102 (1997-09-01), Suzuki et al.
patent: 5675401 (1997-10-01), Wangler et al.
patent: 5712698 (1998-01-01), Poschenrieder et al.
patent: 5742376 (1998-04-01), Makinouchi
patent: 5757470 (1998-05-01), Dewa et al.
patent: 5896188 (1999-04-01), McCullough
patent: 5963305 (1999-10-01), Mizouchi
patent: 6016187 (2000-01-01), Noguchi et al.
patent: 6049374 (2000-04-01), Komatsuda
patent: 6084655 (2000-07-01), Suzuki et al.
patent: 6128068 (2000-10-01), Suzuki et al.
patent: 6211944 (2001-04-01), Shiraishi
patent: 6233041 (2001-05-01), Shiraishi
patent: 6252647 (2001-06-01), Shiraishi
patent: 6259512 (2001-07-01), Mizouchi
patent: 6271909 (2001-08-01), Suzuki et al.
patent: 6285443 (2001-09-01), Wangler et al.
patent: 6285855 (2001-09-01), Tsuji
patent: 6628370 (2003-09-01), McCullough et al.
patent: 2001/0007495 (2001-07-01), Suzuki et al.
patent: 2001/0015797 (2001-08-01), Suzuki et al.
patent: 0 011 709 (1979-10-01), None
patent: 747772 (1996-04-01), None
patent: 61-91662 (1986-05-01), None
patent: WO 92/03842 (1992-03-01), None
Cronin et al., “Dynamic Coherent Optical System,” Optical Engineering, Mar./Apr. 1973, vol. 12, No. 2, pp. 50-55.
Reynolds, “A Concept for a High Resolution Optical Lithographic System for Producing One-Half MicronLinewidths,” Optical Microlithography V (1986) SPIE vol. 633, pp. 228-238.
Yang et al., “Effect of Central Obscurationon Image Formation in Projection Lithography,” SPIEvol. 1264 Optical/Laser Microlithography III (1990), pp. 477-485.
Pol et al., “Excimer laser based lthography: a deep-ultraviolet wafer stepper for VLSI processing,” Optical Engineering, Apr. 1987, vol. 26, No. 4, pp. 311-318.
Berry, “Pattern recognition automatic fine alignment,” reprinted from Optical Microlithography—Technologyfor the Mid-1980s, Proc. SPIE vol. 334, pp. 10-16 (1982).
Fehrs et al. “Illuminator Modification of an Optical Aligner,” KTI Microelectronics Seminar, Proceddings, Nov. 6-7, 1989, San Diego, CA pp. 217-230.

Affiliated with

Also associated with

Rating

Lithography apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithography apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3640671