Lithography apparatus

Details Lithography apparatus Lithography apparatus

1987-10-09

1989-04-11

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

364491, H01J 37302

Patent

active

048209287

ABSTRACT:
A lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, including a framing pattern memory for storing therein closed framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for scanning the framing pattern memory having stored therein closed framing lines of the pattern to be drawn and for generating a beam deflection address for drawing the pattern and a beam blanking control signal.

REFERENCES:
patent: 4280186 (1981-07-01), Hidai et al.
patent: 4538232 (1985-08-01), Koyama

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