Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2007-01-16
2007-01-16
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S077000, C248S636000, C430S022000
Reexamination Certificate
active
10369569
ABSTRACT:
An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
REFERENCES:
patent: 4952858 (1990-08-01), Galburt
patent: 5285142 (1994-02-01), Galburt et al.
patent: 5835195 (1998-11-01), Gibson et al.
patent: 5931441 (1999-08-01), Sakamoto
patent: 6036162 (2000-03-01), Hayashi
patent: 6285444 (2001-09-01), Osanai et al.
patent: 6307619 (2001-10-01), Galburt et al.
patent: 6327024 (2001-12-01), Hayashi et al.
patent: 6329780 (2001-12-01), Ebihara et al.
patent: 6388733 (2002-05-01), Hayashi
patent: 6493062 (2002-12-01), Tokuda et al.
patent: 6538719 (2003-03-01), Takahashi et al.
patent: 6538720 (2003-03-01), Galburt et al.
patent: 2003/0117600 (2003-06-01), Taniuchi et al.
patent: 2003/0142281 (2003-07-01), Nishi
patent: 1 041 607 (2000-04-01), None
patent: WO 00/14779 (2000-03-01), None
U.S. Appl. No. 10/095,070, filed Feb. 28, 2001, Daniel N. Galburt.
Copy of Search Report for European Application No. 02 004 557.1, issued on Jan. 7, 2005.
English Abstract for Japanese Patent Publication No. 2001-35773, 1 page, provided by the European Patent Office, Copyright 2001 (JPO).
English Abstract for Japanese Patent Publication No. 8-306617, 1 page, provided by the European Patent Office, Copyright 1996 (JPO).
Galburt Daniel N.
Kochersperger Peter C.
ASML Holding N.V.
Mathews Alan
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
Lithographic tool with dual isolation system and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic tool with dual isolation system and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic tool with dual isolation system and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3733857