Lithographic template and method of formation and use

Details Lithographic template and method of formation and use Lithographic template and method of formation and use

2008-09-16

2008-09-16

Hendricks, Keith D. (Department: 1794)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S312000, C430S313000

Reexamination Certificate

active

11213071

ABSTRACT:
A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template (10) and the method of making comprises forming a transparent conductive layer (16) over a substrate (12). A SiCN layer (18) is formed over the transparent conductive layer (16), and a patterning layer (20) formed on the SiCN layer (18). The SiCN layer (18) is converted to an SiO2layer by applying an O2plasma (23). The SiO2layer prevents damage to the transparent conductive layer (16) during cleaning and provides a binding mechanism for the imprint release coating.

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Bharadwaj et al . (Oxidation Behavior of a Fully Dense Polymer-Derived Amorphous Silicon Carbonitride Ceramic; Journal of the American Ceramic Society 87 (3), 483-486).
Wolf et al. (Silicon Processing for the VLSI Era; vol. 1; 1986; Lattice Press).

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