Lithographic template and method of formation and use

Details Lithographic template and method of formation and use Lithographic template and method of formation and use

2005-05-10

2005-05-10

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S302000, C430S309000, C430S310000, C430S311000, C430S313000, C430S527000, C101S450100, C101S456000, C101S463100, C216S044000

Reexamination Certificate

active

06890688

ABSTRACT:
This invention relates to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10, 110, 210) is formed having a substrate (12, 112, 212) and a charge dissipation layer (20, 120, 220), and a patterned imageable relief layer, (16, 116, 216) formed on a surface (14, 114, 214) of the substrate (10, 110, 210) using radiation. The template (10, 110, 210) is used in the fabrication of a semiconductor device (344) for affecting a pattern in the device (344) by positioning (338) the template (10, 11, 210) in close proximity to semiconductor device (344) having a radiation sensitive material (334) formed thereon and applying a pressure (340) to cause the radiation sensitive material to flow into the relief image present on the template (10, 110, 210). Radiation (342) is then applied through the template (10, 110, 210) to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template (10, 110, 210) is then removed to complete fabrication of semiconductor device (344).

REFERENCES:
patent: 5772905 (1998-06-01), Chou
patent: 5792411 (1998-08-01), Morris et al.
patent: 6387787 (2002-05-01), Mancini et al.
patent: 6517977 (2003-02-01), Resnick et al.
patent: 4140712 (1992-10-01), None
patent: 0614123 (1994-09-01), None
Horigome et al., “Novel stamper process for optical disc,” SPIE vol. 899 Optical Storage Technology and Applications (1988), pp. 123-128.
Hollingsworth et al., “Resistless patterning of hydrogenated amorphous silicon films,” Mat. Res. Soc. Symp. Proc. vol. 557, 1999 Materials Research Society, pp. 821-826.
Wei et al., “Direct patterning ITO transparent conductive coatings,” Solar Energy Materials & Solar Cells 68 (2001), pp. 383-390.

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