Lithographic systems and methods with extended depth of focus

Details Lithographic systems and methods with extended depth of focus Lithographic systems and methods with extended depth of focus

2011-01-25

2011-01-25

Nguyen, Kiet T (Department: 2881)

Photocopying

Projection printing and copying cameras

C355S053000, C355S067000

Reexamination Certificate

active

07876417

ABSTRACT:
An optical lithography system that has extended depth of focus exposes a photoresist coating on a wafer, and includes an illumination sub-system, a reticle, and an imaging lens that has a pupil plane function to form an aerial image of the reticle proximate to the photoresist. The pupil plane function provides the extended depth of focus such that the system may be manufactured or used with relaxed tolerance, reduced cost and/or increased throughput. The system may be used to form precise vias within integrated circuits even in the presence of misfocus or misalignment.

REFERENCES:
patent: 2959105 (1960-11-01), Sayanagi
patent: 5142413 (1992-08-01), Kelly
patent: 5218471 (1993-06-01), Swanson et al.
patent: 5280388 (1994-01-01), Okayama et al.
patent: 5307175 (1994-04-01), Seachman
patent: 5323208 (1994-06-01), Fukuda et al.
patent: 5337181 (1994-08-01), Kelly
patent: 5348837 (1994-09-01), Fukuda et al.
patent: 5426521 (1995-06-01), Chen et al.
patent: 5438366 (1995-08-01), Jackson et al.
patent: 5555129 (1996-09-01), Konno et al.
patent: 5610684 (1997-03-01), Shiraishi
patent: 5650632 (1997-07-01), Coufal
patent: 5680588 (1997-10-01), Gortych et al.
patent: 5748371 (1998-05-01), Cathey et al.
patent: 5756981 (1998-05-01), Roustaei et al.
patent: 5886812 (1999-03-01), Volk
patent: 5969853 (1999-10-01), Takaoka
patent: 6016185 (2000-01-01), Cullman et al.
patent: 6021005 (2000-02-01), Cathey et al.
patent: 6069738 (2000-05-01), Cathey et al.
patent: 6091548 (2000-07-01), Chen
patent: 6097856 (2000-08-01), Hammond, Jr.
patent: 6144493 (2000-11-01), Okuyama et al.
patent: 6261727 (2001-07-01), Wang
patent: 6333780 (2001-12-01), Tsukuda
patent: 6404482 (2002-06-01), Shiraishi
patent: 7026081 (2006-04-01), Van Den Broeke et al.
patent: 2002/0118457 (2002-08-01), Dowski, Jr.
patent: 2004/0145808 (2004-07-01), Cathey, Jr. et al.
patent: 2004/0190762 (2004-09-01), Dowski, Jr. et al.
patent: 2004/0228005 (2004-11-01), Dowski, Jr.
patent: 1350193 (2002-05-01), None
patent: 0531926 (1993-03-01), None
patent: 08-148411 (1996-06-01), None
patent: WO 02/057832 (2002-07-01), None
patent: WO 03/021333 (2003-03-01), None
patent: WO 03/073153 (2003-09-01), None
patent: WO 2005/054927 (2005-06-01), None
O'Shea et al., “Chapter 33, Aberration Curves in Lens Design”, Handbook of Optics, vol. 1, 1995, pp. 33.1-33.5, McGraw-Hill, NY.
Poon, et al., “Optical/digital incoherent image processing for extended depth of field”, Appl. Opt. vol. 26 (21), Nov. 1, 1987, pp. 4612-4615.
Bradburn et al., “Realizations of focus invariance in optical-digital systems with wave-front coding,” Appl. Opt. vol. 36 (35), Dec. 10, 1997, pp. 9157-9166.
Van Der Gracht et al., “Aspheric optical elements for extended depth of field imaging,” SPIE vol. 2537, 1995, pp. 279-288.
Ojeda-Castaneda et al., “Spatial filter for increasing the depth of focus,” Opt. Lett., vol. 10 (11), Nov. 1985, pp. 520-522.
Ojeda-Castaneda et al., “High focal depth by quasibifocus,” Appl. Opt., vol. 27 (20), Oct. 15, 1988, pp. 4163-4165.
Chi et al., “Electronic imaging using a logarithmic asphere,” Opt. Lett., vol. 26 (12), Jun. 15, 2001, pp. 875-877.
Marks et al., “Three-dimensional tomography using a cubic-phase plate extended depth-of-field system,” Opt. Lett., vol. 24 (4), Feb. 15, 1999, pp. 253-255.
Bartelt et al., “Misfocus tolerance seen by simple inspection of the ambiguity function,” Appl. Opt., vol. 23 (16), Aug. 15, 1984, pp. 2693-2696.
Ojeda-Castaneda et al., “Ambiguity function as a design tool for high focal depth,” Appl. Opt., vol. 27 (4), Feb. 15, 1988, pp. 790-795.
Ojeda-Castaneda et al., “Annular apodizers for low sensitivity to defocus and to spherical aberration,” Opt. Lett., vol. 11 (8), Aug. 1986, pp. 487-489.
Ojeda-Castaneda et al., “Arbitrarily high local depth with a quasioptimum real and positive transmittance apodizer,” Appl. Opt., vol. 28 (13), Jul. 1, 1989, pp. 2666-2670.
Ojeda-Castaneda et al., “Arbitrarily high focal depth with finite apertures,” Opt. Lett., vol. 13 (3), Mar. 1988, pp. 183-185.
Indebetouw et al., “Imaging with Fresnel zone pupil masks: extended depth of field,” Appl. Opt., vol. 23 (23), Dec. 1, 1984, pp. 4299-4302.
Welford, “Use of annular apertures to increase focal depth,” JOSA, vol. 50 (8), Aug. 1960, pp. 749-753.
Cathey et al., Image gathering and processing for enhanced resolution, JOSA A, vol. 1 (3), Mar. 1984, pp. 241-250.
Van Der Gracht et al., “Broadband behavior of an optical-digital focus-invariant system,” Opt. Lett., vol. 21 (13), Jul. 1, 1996, pp. 919-921.
Hausler, “A method to increase the depth of focus by two step image processing,” Opt. Comm., vol. 6 (1), Sep. 1972, pp. 38-42.
Wang et al., “High focal depth with a pure phase apodizer,” Appl. Opt., vol. 40 (31), Nov. 1, 2001, pp. 5658-5662.
Sherif et al., “A logarithmic phase filter to extend the depth of field of incoherent hybrid imaging systems,” SPIE Proceedings, vol. 4471, Nov. 2001, pp. 272-279.
Pieper et al., “Image processing for extended depth of field,” Appl. Opt. vol. 22 (10), May 15, 1983, pp. 1449-1453.
Dowski et al., “Extended depth of field through wavefront coding,” Appl. Opt., vol. 34 (11), Apr. 10, 1995, pp. 1859-1866.
Ojeda-Castaneda et al., “High focal depth by apodization and digital restoration,” Appl. Opt., vol. 27 (12), Jun. 15, 1988, pp. 2583-2586.
Ojeda-Castaneda et al., “Zone plate for arbitrarily high focal depth,” Appl. Opt., vol. 29 (7), Mar. 1, 1990, pp. 994-997.
McCrickerd, “Coherent processing and depth of focus of annular aperture imagery,” Appl. Opt., vol. 10 (10), Oct. 1971, pp. 2226-2230.
Greivenkamp, “Color dependent optical prefilter for the suppression of aliasing artifacts,” Appl. Opt., vol. 29 (5), Feb. 10, 1990, pp. 676-684.
Hausler et al., “Imaging with expanded depth of focus,” Zeiss Inform, Oberkochen, 29 (98E), 1986/1987, pp. 9-13.
Fukuda et al., “A new pupil filter for annular illumination in optical lithography,” JJAP, vol. 31, part I, No. 12B, Dec. 1992, pp. 4126-4130.
Fukuda et al., “Spatial filtering for depth of focus and resolution enhancement in optical lithography,” J. Vac. Sci. Technol., vol. B9, Nov./Dec. 1991, pp. 3113-3116.
Fukuda et al., “Evaluation of pupil-filtering in high-numerical aperture I-line lens,” JJAP, vol. 32, part I, No. 12B, Dec. 1993, pp. 5845-5849.
Chen et al., “Design of the point spread function of a lens, binary phase filter combination and its application to photolithography,” Opt. Comm., vol. 119 (1995), pp. 381-389.
Von Bunau et al., “Optimization of pupil filters for increased depth of focus,” JJAP, vol. 32, part. 1, No. 12B, Dec. 1993, pp. 5850-5855.
Levinson, “Principles of Lithography,” SPIE publications, 2001, pp. 39-40.
Brueck, “Optical and Interferometric Lithography—Nanotechnology Enablers,” Proceedings Of the IEEE, vol. 93, No. 10, Oct. 2005, pp. 1-18.
Brueck, Steven R.J.; “There Are No Fundamental Limits To Optical Lighography” International Trends In Applied Optics, pp. 85-109, 2002.
Selected File History from related U.S.Appl. No. 10/858,337, Dec. 7, 2005 through Mar. 16, 2006, 21 pages.
International Search Report from related PCT Patent Application Serial No. PCT/US2004/17508, issued Aug. 19, 2005, 4 pages.
Written Opinion from related PCT Patent Application Serial No. PCT/US2004/17508, issued Aug. 19, 2005, 4 pages.
Office Action & English Translation issued in related CN 200480014933.0, dated Apr. 6, 2007, 14 pages.
Response to Office Action dated Apr. 6, 2007 filed in related CN 200480014933.0, Aug. 21, 2007, 33 pages.
Office Action & English Translation issued in related CN 200480014933.0, dated Mar. 28, 2008, 6 pages.
Response to Office Action dated Ma

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