Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1997-08-22
1998-07-14
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430 5, 430 22, 430296, 430312, 430394, 430942, 430967, 355 53, G03F 900, G03B 2742
Patent
active
057801886
ABSTRACT:
A system and method for exposing a layer of resist on a target such as a semiconductor wafer are provided. An optical system includes a step and repeat projection aligner, and a mask having adjacent complementary pattern segments arranged in an alternating array of columns and rows. The method includes exposing the layer of resist in multiple stages by directing exposure energy through the mask onto the target. During each stage the target can be stepped through unequal stepping distances. A first stepping distance can be a width of a single pattern segment, and a second stepping distance can be a combined width of multiple pattern segments. The unequal stepping distances permit the complementary pattern segments to be initially exposed, and then overlayed on the target using relatively short stepping distance across most of the target.
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"Intelligent design splitting in the stencil mask technology used for electron-and ion-beam lithography", U. Behringer et al., J. Vac. Sci. Technology B 11(6), Nov./Dec. 1993, pp. 2400-2403.
Wolf, Stanley et al, Silicon Processing For the VLSI Era, vol. 1, Process Technology, Lattice Press, 1986, pp. 472-483.
Gratton Stephen A.
Micro)n Technology, Inc.
Young Christopher G.
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