Lithographic scanning exposure projection apparatus

Details Lithographic scanning exposure projection apparatus Lithographic scanning exposure projection apparatus

1997-03-27

1999-11-16

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, G03B 2742, G03B 2754

Patent

active

059867426

ABSTRACT:
A lithographic scanning exposure projection apparatus is provided with a radiation source (1) providing radiation pulses, a lens system (3, 7), a mask (5), imaged onto a substrate (9) and scanning apparatus (10) for scanning an image of an exit window (2) of the radiation source at a scanning speed over the substrate (9). A controller (13) controls both the energy of the radiation pulses and the scanning speed in dependence on the required exposure dose on the substrate and the repetition rate of the radiation pulses. The controller ensures maximum throughput of substrates through the apparatus and a minimum dose non-uniformity on the substrates.

REFERENCES:
patent: 4924257 (1990-05-01), Jain
patent: 5663784 (1997-09-01), Tanimoto
patent: 5699148 (1997-12-01), Shiozawa
patent: 5721608 (1998-02-01), Taniguchi
patent: 5728495 (1998-03-01), Ozawa
patent: 5777724 (1998-07-01), Suzuki
"Exposure Dose Control Techniques for Excimer Laser Lithography", by David H. Tracy and Fred Y. Wu published in Proceedings of the SPIE, vol. 922, Optical / Laser Microlithography (1998), pp. 437-443.
"Sub-micron 1:1 Optical Lithography" by David A. Markle in the journal Semiconductor International, May, 1996, pp. 137-142.

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