Lithographic projection mask, device manufacturing method,...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S055000

Reexamination Certificate

active

07019814

ABSTRACT:
A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks that may be used in such a method.

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