Lithographic projection apparatus with multiple suppression...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S030000

Reexamination Certificate

active

06906788

ABSTRACT:
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.

REFERENCES:
patent: 6614505 (2003-09-01), Koster et al.
patent: 2002/0109828 (2002-08-01), Moors et al.
patent: 1 182 510 (2002-02-01), None
Nguyen et al., “Imaging of extreme ultraviolet lithographic masks with programmed substrate defects,”J. Vac. Sci. Technol. B12(6):3833-3840, XP-002096163 (1994).

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