Lithographic projection apparatus, mirror, method of...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C359S360000, C359S838000

Reexamination Certificate

active

07420653

ABSTRACT:
A lithographic projection apparatus includes a radiation system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to pattern the beam according to the desired pattern; a substrate table configured to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. A component of the lithographic projection apparatus is at least partially provided with a cap layer that includes aluminum nitride.

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patent: 2002/0109954 (2002-08-01), Tsuruta
patent: 2003/0027053 (2003-02-01), Yan
patent: 1 065 568 (2001-01-01), None
patent: 3-105912 (1991-05-01), None
Oestreich et al., “Multilayer reflectance during exposure to EUV radiation,”Proceedings of SPIE4146:64-71 (2000).

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