Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2006-09-26
2006-09-26
Nguyen, Kiet T. (Department: 2881)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
07113254
ABSTRACT:
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.
REFERENCES:
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 5892572 (1999-04-01), Nishi
patent: 6394109 (2002-05-01), Somekh
patent: 6582496 (2003-06-01), Cheng et al.
patent: 6724460 (2004-04-01), Van Schaik et al.
patent: 6828569 (2004-12-01), Van Schaik et al.
patent: 6829034 (2004-12-01), Miwa et al.
patent: 6961113 (2005-11-01), Hayashi et al.
patent: 2002/0057423 (2002-05-01), Nogawa
patent: 2003/0035087 (2003-02-01), Murayama
patent: 2005/0017198 (2005-01-01), Van Der Net et al.
patent: 0 571 997 (1993-12-01), None
patent: 0 678 321 (1995-10-01), None
patent: 2001-358055 (2001-12-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/010619 (2005-02-01), None
Spiegelman Jeffrey J.
Van Bragt Erik Johannus Josephus
Van Der Net Antonius Johannes
ASML Netherlands B.V.
Nguyen Kiet T.
Pillsbury Winthrop Shaw & Pittman LLP
LandOfFree
Lithographic projection apparatus, gas purging method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic projection apparatus, gas purging method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic projection apparatus, gas purging method,... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3576764