Lithographic projection apparatus and reflector assembly for...

Details Lithographic projection apparatus and reflector assembly for... Lithographic projection apparatus and reflector assembly for...

2005-02-22

2005-02-22

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C378S085000, C250S50400H

Reexamination Certificate

active

06859259

ABSTRACT:
A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam provides the beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

REFERENCES:
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6285737 (2001-09-01), Sweatt et al.
patent: 20030095623 (2003-05-01), Singer et al.
patent: 101 38 284 (2003-02-01), None
patent: 1 211 918 (2002-06-01), None

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