Lithographic processing cell, lithographic apparatus, track...

Photocopying – Projection printing and copying cameras – With developing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C396S611000, C438S014000, C438S016000, C700S121000

Reexamination Certificate

active

07403259

ABSTRACT:
A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.

REFERENCES:
patent: 6210846 (2001-04-01), Rangarajan et al.
patent: 6466300 (2002-10-01), Deguchi
patent: 6740534 (2004-05-01), Adams et al.
patent: 7033903 (2006-04-01), Lin et al.
patent: 2002/0081758 (2002-06-01), Iriki
patent: 2003/0155077 (2003-08-01), Hisai et al.
patent: 2003/0169411 (2003-09-01), Ota
patent: 2004/0029025 (2004-02-01), Hommen et al.
patent: 2004/0102857 (2004-05-01), Markle et al.
patent: 62-162535 (1987-07-01), None
patent: 5-21307 (1993-01-01), None
patent: 2000-16756 (2000-01-01), None
patent: 2001-15408 (2001-01-01), None
patent: 2002-198289 (2002-07-01), None
patent: 2003-243295 (2003-08-01), None
Hickman, et al., “Use of Diffracted Light from Latent Images to Improve Lithography Control,” SPIE vol. 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1991), pp. 245-257.
Przybyla, J., et al., “A Fully Integrated Photolithography Workcell”, International Semiconductor Manufacturing Science Symposium, May 1989, pp. 100-107.
European Search Report for European Application No. 03 25 6573, dated Jun. 28, 2004.
Notice of Reasons for Rejection dated Jan. 30, 2008 for Japanese Patent Application No. 2004-329761.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic processing cell, lithographic apparatus, track... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic processing cell, lithographic apparatus, track..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic processing cell, lithographic apparatus, track... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2816102

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.