Lithographic processing cell and device manufacturing method

Details Lithographic processing cell and device manufacturing method Lithographic processing cell and device manufacturing method

2007-03-30

2009-11-10

Lee, Diane I (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C438S689000, C438S708000, C438S699000

Reexamination Certificate

active

07616291

ABSTRACT:
A double processing technique for device manufacture includes performing a first patterning step to form apertures in a resist layer which apertures are filled before the first resist layer is stripped and replaced by a second resist layer to be used in the second exposure.

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patent: 6867116 (2005-03-01), Chung
patent: 6974549 (2005-12-01), Ohgaki
patent: 2003/0006410 (2003-01-01), Doyle
patent: 2005/0137734 (2005-06-01), Nieuwelaar et al.
patent: 2007/0229828 (2007-10-01), Kruiswijk
patent: 2004-281835 (2004-10-01), None
A machine translation of JP-2004 281835 A.
Non-Final Rejection mailed Sep. 4, 2008 for U.S. Appl. No. 11/396,915, filed Apr. 4, 2006, 10 pgs.
Final Rejection mailed Feb. 3, 2009 for U.S. Appl. No. 11/396,915, filed Apr. 4, 2006, 8 pgs (Final amended to Non-Final).
Second Non-Final Rejection mailed Mar. 25, 2009 for U.S. Appl. No. 11/396,915, filed Apr. 4, 2006, 9 pgs.

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