Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-05-21
1998-05-26
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430 30, 356400, 356401, H01L 2130, G03F 100
Patent
active
057562385
ABSTRACT:
A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration. A slope of an imaging profile may also be determined from print bias information overlay may be determined by imaging a print bias target on top of a prior level image to create an overlay target, determining a center of the prior level image, determining an average center of the print bias target and determining a location of the average center relative to the prior level image center, thereby determining the overlay.
REFERENCES:
patent: 4433911 (1984-02-01), Sawada et al.
patent: 4496971 (1985-01-01), West et al.
patent: 4758094 (1988-07-01), Wihl et al.
patent: 5296917 (1994-03-01), Kusonose et al.
patent: 5300786 (1994-04-01), Brunner et al.
patent: 5677091 (1997-10-01), Barr et al.
Ohtsuka, H., Abe, K. and Itoh, Y., "Quantitative Evaluation Method at Conjugate Point for Practical Resolution of Wafer Stepper", SPIE, vol. 1088 Optical/Laser Microlithography II, 1989, pp. 124-132.
Barr Roger Lawrence
Couillard Patrick J.
Angebranndt Martin
International Business Machines - Corporation
Reinke, Esq. Wayne F.
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