Lithographic plates and photoresists having stabilized photosens

Details Lithographic plates and photoresists having stabilized photosens Lithographic plates and photoresists having stabilized photosens

1983-06-17

1985-02-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430176, 430179, G03C 160, G03C 174, G03F 716

Patent

active

044991703

ABSTRACT:
Plates such as those used in lithographic printing and photoresists such as those used in preparing printed circuit boards and the like are provided with a photopolymerizable photosensitive diazo resin that is unusually stable. The diazo resin is laid down from a stabilized diazonium composition that is an emulsion including the selected diazo resin, a purine derivative, especially a theophylline derivative, preferably in combination with a salt of a low molecular weight alkyl sulfonic acid or other supplementary stabilizer component.

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patent: 3386828 (1968-06-01), Slimowicz
patent: 3808004 (1974-04-01), Thomas et al.
patent: 4230492 (1980-10-01), Thomas

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