Lithographic plate and photoresist having photosensitive layers

Details Lithographic plate and photoresist having photosensitive layers Lithographic plate and photoresist having photosensitive layers

1978-01-17

1979-01-09

Bowers, Jr., Charles L.

Gas separation: apparatus

Electric field separation apparatus

Including gas flow distribution means

96 33, 96 351, 96 36, 96 362, 96 363, 96 75, 96 86P, 96115R, G03C 152, G03C 168, G03F 708

Patent

active

041336852

ABSTRACT:
A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated polyvinyl alcohol resin which is placed over a diazo based material.

REFERENCES:
patent: 2610120 (1952-09-01), Minsk et al.
patent: 3136637 (1964-06-01), Larson
patent: 3173787 (1965-03-01), Clement
patent: 3376139 (1968-04-01), Giangualano et al.
patent: 3387976 (1968-06-01), Sorkin
patent: 3462267 (1969-08-01), Giangualano et al.
patent: 3622331 (1971-11-01), Thomas
patent: 3652272 (1972-03-01), Thomas
patent: 3808004 (1974-04-01), Thomas et al.

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