Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1980-10-20
1982-05-18
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430168, 430169, 430287, 430271, 430273, G03C 152, G03C 168, G03F 708
Patent
active
043306110
ABSTRACT:
A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated polyvinyl alcohol resin which is placed over a diazo based material.
REFERENCES:
patent: 2610120 (1952-09-01), Minsk et al.
patent: 3030208 (1962-04-01), Schellenberg et al.
patent: 3136637 (1964-06-01), Larson
patent: 3173787 (1965-03-01), Clement
patent: 3257664 (1966-06-01), Leubner et al.
patent: 3357831 (1967-12-01), Wu
patent: 3376139 (1968-04-01), Giangualano
patent: 3387976 (1968-06-01), Sorkin
patent: 3462267 (1969-08-01), Giangulano et al.
patent: 3622320 (1971-11-01), Allen
patent: 3622331 (1971-11-01), Thomas
patent: 3652272 (1972-03-01), Thomas
patent: 3808004 (1974-04-01), Thomas et al.
patent: 4063953 (1977-12-01), Fukutani et al.
patent: 4133685 (1979-01-01), Thomas et al.
Kosar, J., "Light Sensitive Systems", Wiley & Sons, 1965, p. 137.
Sorkin Jack L.
Thomas Daniel C.
Bowers Jr. Charles L.
Richardson Graphics Company
LandOfFree
Lithographic plate and photoresist having photosensitive layers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic plate and photoresist having photosensitive layers , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic plate and photoresist having photosensitive layers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-487300