Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-29
2011-03-29
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07914952
ABSTRACT:
The present invention is directed to provide a pellicle that can control the deformation of the photomask to a minimum without particular consideration of the flatness of a pellicle frame even in the case where a pellicle is affixed to a photomask for lithography. In the pellicle of the present invention, the pellicle comprises a photomask adhesive for affixing the pellicle to a photomask, the photomask adhesive having a flat surface, wherein the flatness of the surface is no more than 15 μm.
REFERENCES:
patent: 6795170 (2004-09-01), Mishiro et al.
patent: 2003/0095245 (2003-05-01), Mishiro
patent: 2004/0091796 (2004-05-01), Nagata
patent: 2005/0157288 (2005-07-01), Van Peski
patent: 2003007832 (2003-10-01), None
Wistrom R et al. “Influence of the pellicle on final photomask flatness” Proceedings of the SPIE- The International Society for Optical Engineering SPIE-INT. Soc. Opt. Eng USA, vol. 6283, No. 1, 2006, pp. 628326-1 XP002501649.
Fujita M et al. “Pellicle-induced distortions in advanced phototmasks” Proceedings of the SPIE-The International Society for Optical Engineering, SPIE, Bellingham, VA; US vol. 4754, Jul. 1, 2002, pp. 589-596, XP002464927; whole document.
Cotte e p et al. “Experimental and numerical studies of the effects of materials and attachment conditions on pellicle-induced distortions in advanced photomasks” Proceedings of the SPIE—The International Society for Optical Engineering, SPIE, Bellingham, VA; US vol. 4754, Jan. 1, 2002, pp. 579-588, XP002339129; figures 4, 8, p. 585, line 13-p. 586, line 15; figure 16.
Lowe Hauptman & Ham & Berner, LLP
Rosasco Stephen
Shin-Etsu Chemical Co. , Ltd.
LandOfFree
Lithographic pellicle does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic pellicle, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic pellicle will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2664854