Lithographic motion control system and method

Data processing: generic control systems or specific application – Generic control system – apparatus or process – Optimization or adaptive control

Reexamination Certificate

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Reexamination Certificate

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10852688

ABSTRACT:
A lithographic apparatus comprising a control system, such as a motion control system, is presented. The control system includes an actuator for moving a moveable part, a feed-forward path from a setpoint input of the control system to the actuator, a feed-back loop, a feed-forward transfer function of the feed-forward path having a feed-forward transfer function part which is an inverse of a part of the actuator transfer function having a stable inverse, the actuator transfer function including a part having a stable inverse and a remainder potentially having an unstable inverse. The setpoint path includes a setpoint delay function, and the feed-forward transfer function further includes a second feed-forward transfer function part. A difference in delay between the setpoint delay function and the second feed-forward transfer function part is equal to a delay of the potentially unstable remainder of the actuator transfer function.

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Ji-Zheng Chu, Shi-Shang Jang and Yu-Nan Chen, “A Comparative Study of Combined Feedforward/Feedback Model Predictive Control for Nonlinear Systems”, 2004, The Canadian Journal of Chemical Engineering.

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