Lithographic method of manufacturing a device

Details Lithographic method of manufacturing a device Lithographic method of manufacturing a device

2006-05-02

2006-05-02

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07037626

ABSTRACT:
For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a,120b,120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.

REFERENCES:
patent: 6541165 (2003-04-01), Pierrat
patent: 6593064 (2003-07-01), Gelbart
patent: 6670695 (2003-12-01), Gau et al.
patent: 6807662 (2004-10-01), Toublan et al.

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