Lithographic method for maskless pattern transfer onto a...

Details Lithographic method for maskless pattern transfer onto a... Lithographic method for maskless pattern transfer onto a...

2011-07-19

2011-07-19

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S077000, C359S198100, C359S199100, C359S212100, C359S877000, C359S881000

Reexamination Certificate

active

07982853

ABSTRACT:
The invention proposes a Subpixel Scroll method, which optically shifts the position of the mirror elements to the projection axis by one subpixel size each, with an additional 45° mirror between DMD and projection optics. The 45° mirror is shifted by ¼ mirror element width by means of a controllable actuator. The size of this change of position and the time are synchronized in such a way by the position indicator signals of the scan sled that the mirror element seems to stand relative to the substrate surface element. This resetting is however not bound to the DMD-switching speed of 10 kHz. Among other advantages, the invention reduces the blur at the edge transition by the higher resolution and facilitates a higher scan velocity, whereby the scan velocity depends on the dynamics of the actuator, the effective UV-power of the UV-source and the sensitivity of the photosensitive polymer.

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Dauerstäet al., Application of Spatial Light Modulators for Microlithography, Proceedings of SPIE vol. 5348 (SPIE, Bellingham, WA, 2004), pp. 119-126.

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