Lithographic method and apparatus

Details Lithographic method and apparatus Lithographic method and apparatus

2005-02-15

2005-02-15

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S322000, C430S396000, C430S311000, C430S005000, C355S053000, C355S071000

Reexamination Certificate

active

06855486

ABSTRACT:
A method of imaging a pattern in a microlithographic exposure apparatus includes performing two exposures, each with a different mask, the superposition of the images defined by the two masks produces the complete circuit pattern. A dipolar illumination mode is used for each exposure, the dipoles of the two exposures being mutually perpendicular. The dipolar illumination mode of the first exposure is used to image mask features parallel to a first direction, and the dipolar illumination mode of the second exposure is used to image mask features perpendicular to the first direction.

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