Lithographic mask structure and process for preparing the same

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

378 34, 378 35, G03F 900, G21K 500

Patent

active

048046000

ABSTRACT:
There is disclosed a lithographic mask structure including a mask support film, and a support substrate, wherein the peripheral portion of the mask support film is attached on the surface of the support substrate which has a groove.

REFERENCES:
patent: 3311425 (1967-03-01), Schraub
patent: 3504878 (1970-04-01), Dressler
patent: 4171489 (1979-10-01), Adams et al.
patent: 4260670 (1981-04-01), Burns
patent: 4454209 (1984-06-01), Blais
patent: 4579616 (1986-04-01), Windeschmann et al.
patent: 4677042 (1987-06-01), Kato et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic mask structure and process for preparing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic mask structure and process for preparing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic mask structure and process for preparing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1365150

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.