Lithographic mask structure and method of producing the same com

Details Lithographic mask structure and method of producing the same com Lithographic mask structure and method of producing the same com

1995-12-11

1998-03-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900

Patent

active

057336881

ABSTRACT:
A mask suitably usable in X-ray lithography has a membrane and a radiation absorbing material pattern formed on the membrane, wherein the radiation absorbing material pattern contains an alloy including tungsten (W) and molybdenum (Mo), the proportion of the molybdenum content to the alloy being in a range of 0.1-50 wt %, the alloy having crystal precedence orientation of {110}. In one preferred form, the absorbing material pattern is provided on an amolphous metal layer formed on the mask membrane.

REFERENCES:
patent: 4738907 (1988-04-01), Shigetomi et al.
patent: 5188706 (1993-02-01), Hori et al.

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