Lithographic mask structure and lithographic process

Details Lithographic mask structure and lithographic process Lithographic mask structure and lithographic process

1986-10-06

1988-04-05

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430139, 430396, 428 65, 2504611, G03F 710

Patent

active

047358777

ABSTRACT:
There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.

REFERENCES:
patent: 3650976 (1972-03-01), Luckey
patent: 3778615 (1973-12-01), Luckey
patent: 4677042 (1987-06-01), Kato et al.

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