Lithographic imaging system

Details Lithographic imaging system Lithographic imaging system

1998-01-13

1999-07-13

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059224975

ABSTRACT:
A layer applied over the reticle used in a lithographic system can improve the image quality of the system. The applied layer may have a thickness of approximately the wavelength of incident light divided by four times its index of refraction.

REFERENCES:
patent: 5686209 (1997-11-01), Iwamatsu et al.

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