Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-03-09
1995-08-29
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430175, 430176, 430204, 430272, 430302, 430320, 428341, 428448, 428451, 428520, 101456, 101457, 101462, G03C 193, G03F 7016
Patent
active
054459125
ABSTRACT:
The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer contiguous to a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica and is applied at a solids content of more than 200 mg per m.sup.2 but less than 750 mg per m.sup.2.
REFERENCES:
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patent: 3161519 (1964-12-01), Alsup
patent: 3520242 (1970-07-01), Kemp et al.
patent: 3736872 (1973-06-01), Martens et al.
patent: 4970133 (1990-11-01), Vermeersch et al.
patent: 5244728 (1993-09-01), Bowman et al.
Coppens Paul
Cortens Willem
Hauquier Guido
Mostaert Erik
Vermeersch Joan
Agfa-Gevaert N.V.
Chu John S. Y.
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