Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-03-09
1995-10-31
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430160, 430175, 430176, 430204, 430272, 430302, 430320, 421341, 421448, 421451, 421520, 101456, 101457, 101462, G03C 193, G03F 7016
Patent
active
054628334
ABSTRACT:
The present invention provides a lithographic base comprising on a hydrophobic support a subbing layer and a hydrophilic layer containing a hydrophilic (co)polymer or (co)polymer mixture and being hardened with a hydrolyzed tetraalkyl orthosilicate crosslinking agent characterized in that said subbing layer contains a hydrophilic binder and silica, the surface area of the silica being at least 300 m.sup.2 per gram.
REFERENCES:
patent: 3736762 (1973-06-01), Martens et al.
patent: 4970133 (1990-11-01), Vermeersch et al.
patent: 4992130 (1991-02-01), Vermeulen et al.
patent: 5008178 (1991-04-01), Van Thillo et al.
Coppens Paul
Cortens Willem
Hauquier Guido
Mostaert Erik
Vermeersch Joan
Agfa-Gevaert N.V.
Chu John S.
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