Lithographic apparatus with alignment subsystem, device...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C430S005000, C430S022000

Reexamination Certificate

active

06995831

ABSTRACT:
A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.

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European Search Reported dated Feb. 5, 2004 in reference to European Application No. 03 07 6010.
European Search Report dated Jan. 28, 2004 in reference to European Application No. 03 07 5432.

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