Lithographic apparatus, thermal conditioning system, and...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S067000, C355S071000, C378S034000

Reexamination Certificate

active

07545478

ABSTRACT:
A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.

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Notice of Reasons for Rejection for Japanese Patent Application No. 2005-130916 dated May 16, 2008.
English Translation of Japanese Official Action issued on Oct. 28, 2008 in related Japanese Application No. 2005-130916.

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