Lithographic apparatus, radiation supply and device...

Details Lithographic apparatus, radiation supply and device... Lithographic apparatus, radiation supply and device...

2006-03-21

2010-06-01

Epps, Georgia Y (Department: 2878)

Photocopying

Projection printing and copying cameras

Illumination systems or details

Reexamination Certificate

active

07728955

ABSTRACT:
A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 6541731 (2003-04-01), Mead et al.
patent: 6753947 (2004-06-01), Meisburger et al.
patent: 7027155 (2006-04-01), Cordingley et al.
patent: 7295362 (2007-11-01), Meisburger
patent: 7297934 (2007-11-01), Kane
patent: 2002/0186359 (2002-12-01), Meisburger et al.
patent: 2004/0021840 (2004-02-01), Heintze
patent: 2004/0126694 (2004-07-01), Devoe et al.
patent: 2004/0239907 (2004-12-01), Hintersteiner et al.
patent: 2005/0024615 (2005-02-01), Bleeker
patent: 2005/0195380 (2005-09-01), Sytsma et al.
patent: 2005/0274909 (2005-12-01), Teunissen et al.
patent: 2008/0291417 (2008-11-01), Visser et al.
patent: 98/33096 (1998-07-01), None
patent: 98/38597 (1998-09-01), None

Affiliated with

Also associated with

Rating

Lithographic apparatus, radiation supply and device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus, radiation supply and device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, radiation supply and device... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4171122