Lithographic apparatus, programmable patterning structure,...

Details Lithographic apparatus, programmable patterning structure,... Lithographic apparatus, programmable patterning structure,...

2006-11-28

2006-11-28

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C250S492220, C345S043000, C345S033000, C355S053000

Reexamination Certificate

active

07141340

ABSTRACT:
Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.

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Seok-Whan Chung et al., “Design and fabrication of 10×10 micro-spatial light modulator array for phase and amplitude modulation,”Sensors and Actuators(1999), pp. 63-70.
European Search Report dated Aug. 22, 2003.

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