Lithographic apparatus, patterning assembly and...

Details Lithographic apparatus, patterning assembly and... Lithographic apparatus, patterning assembly and...

2005-04-06

2008-10-14

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07436485

ABSTRACT:
A lithographic apparatus includes a pattern support to support a patterning device, the patterning device to impart a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a position measurement system to perform a position measurement of a reference mark of the patterning device. Also, the lithographic apparatus includes a contamination monitor to estimate a contamination of at least one of the patterning device and the pattern support by performing first and second position measurements of at least one reference mark of the patterning device and estimating a contamination from a position difference between the first and second position measurements.

REFERENCES:
patent: 4766324 (1988-08-01), Saadat et al.
patent: 5321495 (1994-06-01), Hagiwara et al.
patent: 5710624 (1998-01-01), Utamura
patent: 5870189 (1999-02-01), Uesugi et al.
patent: 5898182 (1999-04-01), Toyama
patent: 6365425 (2002-04-01), Ikota et al.

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