Lithographic apparatus, overlay detector, device...

Details Lithographic apparatus, overlay detector, device... Lithographic apparatus, overlay detector, device...

2003-12-30

2008-03-25

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S494000

Reexamination Certificate

active

07349101

ABSTRACT:
A device according to one embodiment of the invention may be applied to measure the overlay (e.g. as a machine performance number) quickly and over an expanded range of locations (possibly everywhere) on a wafer. One method using such a device includes measuring the amplitude of a diffraction order of a diffraction pattern that results from interference between a pattern on wafer level and a pattern that is projected on the pattern on wafer level. The pattern that is projected may be present, for example, at reticle level.

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