Lithographic apparatus, interferometer and device...

Details Lithographic apparatus, interferometer and device... Lithographic apparatus, interferometer and device...

2007-07-31

2007-07-31

Lauchman, Layla G. (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S511000

Reexamination Certificate

active

10976346

ABSTRACT:
A lithographic apparatus includes an interferometer configured to measure a position of a mirror of the lithographic apparatus. For measuring unflatness of the mirror the interferometer includes a modulator configured to modulate a position of an input beam of the interferometer, a synchronous detector configured to synchronously detect an interfered, modulated beam, and a calculator configured to calculate an unflatness of an area of the mirror from an effect of the modulation of the position of the input beam on an output signal of the synchronous detector. The modulator can include a rotatable, tilted, plan plate.

REFERENCES:
patent: 5790253 (1998-08-01), Kamiya
patent: 6271923 (2001-08-01), Hill
patent: 6842248 (2005-01-01), Binnard et al.
patent: 7019840 (2006-03-01), Wang et al.
patent: 2003/0223079 (2003-12-01), Hill

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