Lithographic apparatus, illumination system and method for...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C250S461100, C250S50400H, C250S559400, C355S053000

Reexamination Certificate

active

07145631

ABSTRACT:
A lithographic apparatus includes a source for generating radiation bursts with a predetermined frequency, an illumination system for conditioning the radiation, a patterning device for patterning the radiation, and a projection system for projecting the patterned radiation onto a substrate. The illumination system includes a debris mitigating system for mitigating debris particles released with the generation of the radiation. The debris mitigating system is arranged to apply on the basis of the predetermined frequency a dynamically applicable condition to which the debris particles are exposed.

REFERENCES:
patent: 4408338 (1983-10-01), Grobman
patent: 2002/0090054 (2002-07-01), Sogard
patent: 2005/0121624 (2005-06-01), Ivanov et al.
patent: 2005/0122491 (2005-06-01), Bakker et al.
patent: 2005/0199829 (2005-09-01), Partlo et al.
patent: 2006/0012761 (2006-01-01), Bakker et al.
patent: WO 99/42904 (1999-08-01), None
patent: WO 03/034153 (2003-04-01), None
patent: WO 03/034153 (2003-04-01), None

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