Lithographic apparatus having double telecentric illumination

Details Lithographic apparatus having double telecentric illumination Lithographic apparatus having double telecentric illumination

2007-06-05

2007-06-05

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

Reexamination Certificate

active

10898290

ABSTRACT:
A system and method are used to pattern illumination to form one or more devices on a substrate using a reflecting system, a pattern generator that defines an objection plane, a projection system, and the substrate that defines an image plane. A reflecting portion of the reflecting system is substantially parallel to a reflecting portion of the pattern generator. The reflecting portion of the pattern generator patterns the illumination beam and directs the patterned illumination beam towards the substrate via the projection system. Based on the relationship of the reflecting system and the pattern generator, the illumination beam is telecentric proximate the object plane and the patterned illumination beam is telecentric proximate the image plane. Through use of a reflecting optic and not a transmissive optic to direct light between the illuminator and the projection system, illumination efficiency is increased and errors imparted on the illumination are decreased.

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