Lithographic apparatus for structuring a subject

Details Lithographic apparatus for structuring a subject Lithographic apparatus for structuring a subject

1989-08-21

1991-02-26

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01V 37317

Patent

active

049964410

ABSTRACT:
In modern electron beam writers, the subject to be structured is simultaneously processed with a plurality of probes or electron beams. The apparatus of the present invention, instead of sub-dividing a single electron beam into a plurality of probes, utilizes a beam generator having a plurality of sources of electron beams, which are arranged line-like and are imaged demagnified with the assistance of a telecentric electron optical arrangement onto the subject which is to be processed or structured.

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van Gorkom et al., "Silicon Cold Cathodes as Possible Sources in Electron Lithography Systems", J. Vac. Sci. Technol., A5(4), Jul./Aug. 1987, pp. 1544-1548.
May et al., "Picosecond Photoelectron Scanning Electron Microscope for Noncontact Testing of Integrated Circuits", Appl. Phys. Lett., vol. 51, No. 2, 13 Jul. 1987, pp. 145-147.
Spindt et al., "The Spindt Field-Emission Cothode", SRI International, Technical Note 2, Nov. 1984, pp. 1-11.
"Flat Panel Displays" Brochure of CEA Commissariat A l'Energie Atomique, C/87 three pages.

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