Plastic article or earthenware shaping or treating: apparatus – Distinct means to feed – support or manipulate preform stock... – Female mold type means
Reexamination Certificate
2006-10-03
2006-10-03
Smith, Duane (Department: 1722)
Plastic article or earthenware shaping or treating: apparatus
Distinct means to feed, support or manipulate preform stock...
Female mold type means
C425S150000, C425S397000, C425S400000, C425S407000
Reexamination Certificate
active
07114938
ABSTRACT:
An apparatus for performing imprint lithography especially useful in creating patterns with ultrafine features on a substrate. The apparatus comprises a substrate having moldable surface carried on a first block, a mold having a molding surface carried on a second block, positioners for moving the first and second blocks relative to each other, a sensor of the relative positions of the blocks and a controller for controlling the relative positions of the blocks.
REFERENCES:
patent: 2302024 (1942-11-01), Goss, Jr.
patent: 3742229 (1973-06-01), Smith et al.
patent: 3833303 (1974-09-01), Burns et al.
patent: 3951548 (1976-04-01), Westell
patent: 4037325 (1977-07-01), Weber et al.
patent: 4200395 (1980-04-01), Smith et al.
patent: 4211489 (1980-07-01), Kleinknecht et al.
patent: 4244683 (1981-01-01), Rowland
patent: 4287235 (1981-09-01), Flanders
patent: 4310743 (1982-01-01), Seliger
patent: 4450358 (1984-05-01), Reynolds
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4512848 (1985-04-01), Deckman et al.
patent: 4516253 (1985-05-01), Novak
patent: 4543225 (1985-09-01), Beaujean
patent: 4588468 (1986-05-01), McGinty et al.
patent: 4592081 (1986-05-01), Eaton et al.
patent: 4731155 (1988-03-01), Napoli et al.
patent: 4883563 (1989-11-01), Kotani et al.
patent: 5259926 (1993-11-01), Kuwabara et al.
patent: 5288698 (1994-02-01), Banjo et al.
patent: 5300169 (1994-04-01), Tahara
patent: 5338396 (1994-08-01), Abdala et al.
patent: 5425848 (1995-06-01), Haisma et al.
patent: 5434107 (1995-07-01), Paranjpe
patent: 5471455 (1995-11-01), Jabr
patent: 5503963 (1996-04-01), Bifano
patent: 5512131 (1996-04-01), Kumar et al.
patent: 5638355 (1997-06-01), Jabr
patent: 6010609 (2000-01-01), Mimura et al.
patent: 6376833 (2002-04-01), Shimada et al.
patent: WO 93/216712 (1993-10-01), None
Kamins, T.I., “Positioning of Self-Assembled, single-crystal, germanium islands by silicon nanoimprinting” Applied Physics Letter, vol. 74, No. 12, Mar. 22, 1999.
Wang, J., et al., “Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography” J. Vac. Sci. Technol. B 17 (6) Nov./Dec. 1999.
Tan, H., et al., “Roller Nanoimprint Lithography” Vac. Sci. Technol. B 16 (6) Nov./Dec. 1998.
Feynman, Richard, “There's Plenty of Room at the Bottom-An Invitation to Enter a New Field of Physics” talk delivered at the annual meeting of the American Physical Society at the California Institute of Technology (Caltech)in 1959, published in Feb. 1960 issue of Caltech's “Engineering and Science”.
Flanders, D.C., “X-ray Lithography at˜ 100 A linewidths using x-ray masks fabricated by shadowing techniques” Journal of Vacuum Science and Technology, 16 (6), Nov./Dec. 1979 (received Jun. 11, 1979), pp. 1615 to 1619, published American Vacuum Society, USA.
Jorritsma et al., “Fabrication of Large arrays of metallic nanowires on V-grooved substrates” Applied Physics Letters 67 (10), Sep. 4, 1995 (received May 16, 1995), pp. 1489-1491, published by American Institute of Physics, USA.
Aumiller et al., “Submicrometer Resolution Replication of Relief Patterns for Integrated Optics”, J. Appl. Phys., vol. 45, pp. 4557-4562, (1974).
Nisper, “Injection-molded replication of binary optic structures”, SPIE v2600 Oct. 23-24, 1995 p. 56-64 0227-786X.
Shvartsman, “Holographic optical elements by dry photopolymer embossing” SPIE (1991) 1461 (pract. Holog. S) pp. 313-320.
“Fabrication of submicron crossed square wave grating by dry etching and thermoplastic replication techniques” JVST B vol. 1, No. 4, Dec. 1983, pp. 1207-1210.
Healey et al., “Photodepostition of Micrometer-scale polymer patterns on optical imaging Fibers” Science vol. 269, Aug. 1995, pp. 1078-1080.
Nguyen Thu Khanh T.
Polster Lieder Woodruff & Lucchesi LC
Regents of the University of Minnesota
Smith Duane
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