Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems
Reexamination Certificate
2007-02-27
2007-02-27
Allen, Stephone B. (Department: 2878)
Radiant energy
Photocells; circuits and apparatus
Photocell controls its own optical systems
C355S053000, C355S067000
Reexamination Certificate
active
10848583
ABSTRACT:
To calibrate a lithographic apparatus having a programmable patterning means, a sensor, such as a CCD, CMOS sensor or photo-diode array, having detector elements larger than the size of a spot corresponding to a single pixel of the programmable patterning means is used. Pixels are selectively activated singly or in groups.
REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6057538 (2000-05-01), Clarke
patent: 6121626 (2000-09-01), Lin
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6486939 (2002-11-01), Lin
patent: 6687041 (2004-02-01), Sandstrom
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 2003/0081303 (2003-05-01), Sandstorm et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0007572 (2005-01-01), George et al.
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 03/046665 (2003-06-01), None
European Search Report for European Appln. 03253333.3 mailed Apr. 14, 2004.
Baselmans Johannes Jacobus Matheus
Bleeker Arno Jan
Allen Stephone B.
ASML Netherlands B.V.
Ellis Suezu
Sterne Kessler Goldstein & Fox P.L.L.C.
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