Lithographic apparatus for fluid pressure imprint lithography

Details Lithographic apparatus for fluid pressure imprint lithography Lithographic apparatus for fluid pressure imprint lithography

2003-08-08

2009-12-22

Gupta, Yogendra (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Preform reshaping or resizing means: or vulcanizing means...

Surface deformation means only

C425S387100, C425S389000, C425S149000, C425S150000

Reexamination Certificate

active

07635262

ABSTRACT:
Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing can be accomplished by sealing the mold against the film and disposing the resulting assembly in a pressurized chamber. The result of this fluid pressing is enhanced resolution and high uniformity over an enlarged area.

REFERENCES:
patent: 4331736 (1982-05-01), Schafer et al.
patent: 5234717 (1993-08-01), Matsuno et al.
patent: 5326240 (1994-07-01), Kudo et al.
patent: 5370760 (1994-12-01), Mori et al.
patent: 5427599 (1995-06-01), Greschner et al.
patent: 5643522 (1997-07-01), Park
patent: 5772905 (1998-06-01), Chou
patent: 5820894 (1998-10-01), Kreutzer
patent: 5863452 (1999-01-01), Harshberger et al.
patent: 5947027 (1999-09-01), Burgin et al.
patent: 7114938 (2006-10-01), Chou
patent: 7137803 (2006-11-01), Chou
patent: 2002/0094496 (2002-07-01), Choi et al.
patent: 3643817 (1988-06-01), None
patent: 0691551 (1996-01-01), None
patent: 0794016 (1997-09-01), None
patent: WO0142858 (2001-06-01), None
M. Colburn et al., “Step and Finish Imprint Lithography: A New Approach to High-Resolution Patterning”, Mar. 1999, Texas Materials Institute, The University of Texas at Austin Texas, Part of the SPIE Conference on Emergining Lithographic Technologies, III (pp. 379-389).

Affiliated with

Also associated with

Rating

Lithographic apparatus for fluid pressure imprint lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus for fluid pressure imprint lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus for fluid pressure imprint lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4099753