Lithographic apparatus, device manufacturing methods, mask...

Details Lithographic apparatus, device manufacturing methods, mask... Lithographic apparatus, device manufacturing methods, mask...

2008-05-27

2008-05-27

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000, C355S075000, C378S035000, C430S005000, C430S020000, C430S022000, C430S322000

Reexamination Certificate

active

07379154

ABSTRACT:
A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

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