Lithographic apparatus, device manufacturing method, device...

Details Lithographic apparatus, device manufacturing method, device... Lithographic apparatus, device manufacturing method, device...

2006-01-24

2006-01-24

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

06989544

ABSTRACT:
The transmission or reflection loss due to surface contamination of a mask is predicted as a function of position on the mask and time. At the time of an exposure compensation for the transmission or reflection loss is effected using a device capable of adjusting the beam intensity across the length of an exposure field.

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