Lithographic apparatus, device manufacturing method and...

Details Lithographic apparatus, device manufacturing method and... Lithographic apparatus, device manufacturing method and...

2005-09-29

2008-10-21

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

07440076

ABSTRACT:
A lithographic apparatus arranged to transfer a pattern from a patterning structure onto a substrate is disclosed that includes a substrate holder configured to hold a substrate and a substrate temperature conditioner configured to condition a temperature of the substrate prior to, during, or both, a transfer of the substrate to the substrate holder to substantially match a temperature of the substrate holder.

REFERENCES:
patent: 4720732 (1988-01-01), Tsutsui
patent: 6342941 (2002-01-01), Nei et al.
patent: 6645701 (2003-11-01), Ota et al.
patent: 05-129181 (1993-05-01), None
patent: 10-116772 (1998-05-01), None
patent: 10-339591 (1998-12-01), None
European Search Report issued for European Patent Application No. 06076807.4-1226, dated Feb. 19, 2007.

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