Lithographic apparatus, device manufacturing method and...

Details Lithographic apparatus, device manufacturing method and... Lithographic apparatus, device manufacturing method and...

2007-10-30

2007-10-30

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

C356S400000, C356S401000, C356S614000, C355S053000, C355S077000

Reexamination Certificate

active

10825215

ABSTRACT:
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.

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