Lithographic apparatus, device manufacturing method, and...

Details Lithographic apparatus, device manufacturing method, and... Lithographic apparatus, device manufacturing method, and...

2007-11-13

2007-11-13

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S400000, C250S492220, C250S492210

Reexamination Certificate

active

10894368

ABSTRACT:
A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system configured to condition a beam of radiation; a support structure configured to support a patterning device that imparts a desired pattern onto the beam of radiation; a projection system that projects the patterned beam onto a target portion of the substrate; and a selection system that selects one out of at least two different operational modes of the lithographic apparatus. The first operational mode is associated with performing a process within a first time period at a first level of accuracy and a second operational mode is associated with performing the process within a second time period at a second level of accuracy. The first time period is shorter than the second time period and the first level of accuracy is lower than the second level of accuracy.

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