Lithographic apparatus, device manufacturing method, and...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S067000, C355S077000

Reexamination Certificate

active

10925214

ABSTRACT:
A lithographic apparatus includes an illumination system for conditioning a projection beam of radiation including components having a first radiation component having a first wavelength and a second radiation component having a second wavelength for reproducing features patterned on a mask. The lithographic apparatus includes an illumination system having an adjustable filter for filtering said beam of radiation, arranged in use, to selectively adjust the proportion of said second radiation component in said beam. Embodiments of the apparatus provide reproduction of both isolated and dense features patterned on the mask.

REFERENCES:
patent: 4937619 (1990-06-01), Fukuda et al.
patent: 5303002 (1994-04-01), Yan
patent: 5372901 (1994-12-01), Rolfson et al.
patent: 5739898 (1998-04-01), Ozawa et al.
patent: 2001/0026448 (2001-10-01), Koizumi et al.
patent: 2002/0048288 (2002-04-01), Kroyan et al.
patent: 2002/0186741 (2002-12-01), Kleinschmidt et al.
patent: 2003/0099040 (2003-05-01), Singer et al.
patent: 2003/0197846 (2003-10-01), Coston et al.
patent: 2004/0135982 (2004-07-01), Kluter
patent: 2004/0233411 (2004-11-01), Shiraishi
patent: 2005/0275818 (2005-12-01), Singer

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus, device manufacturing method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus, device manufacturing method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method, and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3864739

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.