Lithographic apparatus, device manufacturing method and...

Details Lithographic apparatus, device manufacturing method and... Lithographic apparatus, device manufacturing method and...

2007-12-11

2007-12-11

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000, C355S071000, C378S034000, C430S270100, C430S298000

Reexamination Certificate

active

11378634

ABSTRACT:
An immersion lithographic apparatus provides an immersion liquid including photosensitive material(s) configured to form a patterned film on the surface of a substrate on exposure to a radiation beam. Irradiation through the immersion liquid onto a substrate leads to deposition of a film on the substrate. Film formation occurs only in the photoirradiated region, so that the film formed has a pattern corresponding to the pattern of the radiation.

REFERENCES:
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patent: 6952253 (2005-10-01), Lof et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2006/0194142 (2006-08-01), Lin
patent: 99/49504 (1999-09-01), None
Masaya Ichimura et al., “Structural and optical characterization of CdS films grown by photochemical deposition”, Journal of Applied Physics, vol. 85, No. 10, pp. 7411-7417 (1999).

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